ZARCHI, Meysam; AHANGARANI, Shahrokh; SANJARI, Maryam Zare. Properties of Silicon Dioxide Film Deposited By PECVD at Low Temperature/Pressure. Metallurgical and Materials Engineering, [S. l.], v. 20, n. 2, p. 89–96, 2014. DOI: 10.5937/metmateng1402089M. Disponível em: https://metall-mater-eng.com/index.php/home/article/view/159. Acesso em: 11 may. 2026.