ZARCHI, Meysam; AHANGARANI, Shahrokh. A Comparison between Thin-Film Transistors Deposited by Hot-Wire Chemical Vapor Deposition and PECVD. Metallurgical and Materials Engineering, [S. l.], v. 21, n. 1, p. 7–14, 2015. DOI: 10.30544/128. Disponível em: https://metall-mater-eng.com/index.php/home/article/view/128. Acesso em: 7 aug. 2026.